Long-range influence of illumination on the microhardness of aluminum and silicon

Autor:	Yu. A. Mendeleva, David Tetelbaum, E. V. Kuril’chik, O. I. Bystrova
Rok vydání:	2008
Předmět:	Materials science Silicon business.industry Oxide General Physics and Astronomy chemistry.chemical_element Indentation hardness chemistry.chemical_compound Semiconductor chemistry Aluminium Ultrasonic sensor Wafer Composite material business Excitation
Zdroj:	Bulletin of the Russian Academy of Sciences: Physics. 72:1303-1306
ISSN:	1934-9432 1062-8738
DOI:	10.3103/s1062873808090359
Popis:	The long-range effect of illumination (under the conditions excluding significant macroscopic heating of samples) on the microhardness of Al foils and Si wafers has been investigated. The regularities of changes in the microhardness for both materials are qualitatively identical. A model of this effect is proposed, which is based on the ideas about excitation of ultrasonic waves in the metal (semiconductor)-natural oxide system. The experimental data on the effect of a weak ultrasonic field on the silicon microhardness are in agreement with the proposed model.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::da1b11a9378ffbd00e0e5d8987bf7b4f https://doi.org/10.3103/s1062873808090359 Zobrazit plný text záznamu Full text from SpringerLink