Towards molecular-scale kinetic Monte Carlo simulation of pattern formation in photoresist materials for EUV nanolithography

Autor:	Lois Fernandez Miguez, Peter A. Bobbert, Reinder Coehoorn
Rok vydání:	2023
Zdroj:	Advances in Patterning Materials and Processes XL.
DOI:	10.1117/12.2658404
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d9e39745e4dadc30ba950878f2149238 https://doi.org/10.1117/12.2658404 Zobrazit plný text záznamu