Towards molecular-scale kinetic Monte Carlo simulation of pattern formation in photoresist materials for EUV nanolithography
| Autor: | Lois Fernandez Miguez, Peter A. Bobbert, Reinder Coehoorn |
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| Rok vydání: | 2023 |
| Zdroj: | Advances in Patterning Materials and Processes XL. |
| Databáze: | OpenAIRE |
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