Reduction of substrate alkaline contamination by utilizing multi-layer bottom antireflective coating structures in ArF lithography

Autor:	H.L. Chen, M.C. Shih, C.F. Hsieh, B.C. Chen, F.H. Ko
Rok vydání:	2002
Zdroj:	Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).
DOI:	10.1109/imnc.2001.984174
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d982b9405e9047d36c3e400cc7a340bf https://doi.org/10.1109/imnc.2001.984174 Zobrazit plný text záznamu