Novel EUV Resist Materials Design for 14 nm Half Pitch and below

Autor:	Shinji Tarutani, Toru Fujimori, Takahiro Goto, Hideaki Tsubaki, Hiroo Takizawa
Rok vydání:	2014
Předmět:	Materials science Polymers and Plastics Resist business.industry Extreme ultraviolet lithography Organic Chemistry Materials Chemistry Optoelectronics Nanotechnology Materials design business
Zdroj:	Journal of Photopolymer Science and Technology. 27:645-654
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.27.645
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d97ae0d435dfc5b0c5ac985a5ff5232b https://doi.org/10.2494/photopolymer.27.645 Zobrazit plný text záznamu