Atomic nanofabrication with complex light fields

Autor:	Karsten Buse, Angela Kunoth, Dieter Meschede, M. Mützel, U. Rasbach, Jürgen Braun, K. Peithmann, Carsten Burstedde
Rok vydání:	2003
Předmět:	Physics Quantum optics Physics and Astronomy (miscellaneous) Computer simulation business.industry General Engineering Holography General Physics and Astronomy Inverse problem law.invention Superposition principle Optics Nanolithography law Physics::Atomic Physics business Lithography Light field
Zdroj:	Applied Physics B. 77:1-9
ISSN:	1432-0649 0946-2171
DOI:	10.1007/s00340-003-1234-3
Popis:	The method of neutral atom lithography allows one to transfer to a substrate a 2D intensity modulation of an atomic beam imposed by an inhomogeneous light field. The complexity of the pattern depends on the properties of the light field constructed from the superposition of multiple laser beams. For the design of suitable light fields we present a mathematical model with a corresponding numerical simulation of the so-called inverse problem. Furthermore, details of an experiment carried out with a holographically reconstructed light field are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d90123cc0d4a962fffa137ec5bb969f7 https://doi.org/10.1007/s00340-003-1234-3 Zobrazit plný text záznamu Plný text ve formátu PDF