A small unbalanced magnetron sputtering source with multipole magnetic field anode

Autor:	Peilu Wang, Sixiao Zheng, Xiaodong Liao, Guanqing Sun
Rok vydání:	1994
Předmět:	Materials science business.industry Sputter deposition Physics::Classical Physics Anode Magnetic field Electric arc Condensed Matter::Materials Science Optics Nuclear magnetic resonance Physics::Plasma Physics Magnet Cavity magnetron Coaxial business Multipole expansion Instrumentation
Zdroj:	Review of Scientific Instruments. 65:1331-1333
ISSN:	1089-7623 0034-6748
Popis:	A study of a small unbalanced magnetron source with a multipole cusp magnetic field anode is described. The coaxial magnetron principle was extended to the small unbalanced planar magnetron source. In the radial arrangement of magnets, the S pole of the magnet is directed toward the center of the permanent magnet annulus, and the core of the magnetized mild steel was only 5 mm in diameter. Such a construction of the unbalanced magnet arrangment makes the magnetron sputtering target as small as 34 mm in diameter, and increases the sputtering area of the target to 60%. The multipole magnetic field put in the anode can make the unbalanced magnetron source run in a higher discharge current at a lower arc voltage condition after beginning the arc discharge at a higher beginning arc voltage.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d8d77ba7fb341418d64409b87e2a9bb4 https://doi.org/10.1063/1.1145001 Zobrazit plný text záznamu