Summary Abstract: Low temperature reactive deposition of dielectrics

Autor:	W. J. Gignac, R.N. Schwartz, H. P. Gillis
Rok vydání:	1986
Předmět:	Materials science Chemical engineering Surfaces and Interfaces Dielectric Condensed Matter Physics Surfaces Coatings and Films Reactive deposition
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:903-904
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.574004
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d8cddda3ca85403b99872d5a4d64a3a2 https://doi.org/10.1116/1.574004 Zobrazit plný text záznamu