The use of ion beam etching in the process of manufacturing an acoustic delay line
Jazyk: | ruština |
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Rok vydání: | 2022 |
Předmět: |
ÑкоÑоÑÑÑ ÑÑавлениÑ
ion beam etching ионно-лÑÑевое ÑÑавление etching speed акÑÑÑиÑеÑÐºÐ°Ñ Ð»Ð¸Ð½Ð¸Ñ Ð·Ð°Ð´ÐµÑжки ÑÑÑановка ионно-лÑÑевого ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ lithium niobate acoustic delay line Ð½Ð¸Ð¾Ð±Ð°Ñ Ð»Ð¸ÑÐ¸Ñ Ð³Ð»Ñбина ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ ion beam etching installation etching depth |
DOI: | 10.18720/spbpu/3/2022/vr/vr22-2270 |
Popis: | Ð¦ÐµÐ»Ñ ÑабоÑÑ â пÑименение ионно-лÑÑевого ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð² пÑоÑеÑÑе изгоÑÐ¾Ð²Ð»ÐµÐ½Ð¸Ñ Ð°ÐºÑÑÑиÑеÑкой линии задеÑжки. Ð Ñ Ð¾Ð´Ðµ ÑабоÑÑ Ð±Ñл иÑполÑзован меÑод ионно-лÑÑевого ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð´Ð»Ñ Ñого, ÑÑÐ¾Ð±Ñ Ð¿ÑовеÑиÑÑ Ð¿ÑавилÑно ли заÑвлена моделÑнÑм ваÑианÑом ÑÑÑановки ионно-лÑÑевого ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð³Ð»Ñбина ÑÑавлениÑ. ÐÐ»Ñ Ð¿ÑовеÑки нÑжно бÑло пÑовеÑÑи ÑкÑпеÑименÑ, а именно измеÑиÑÑ Ð¿Ð¾ÑеÑи Ñигнала пÑи заданнÑÑ Ð°ÑпекÑÐ°Ñ , коÑоÑÑй как Ñаз и показал, за какое вÑÐµÐ¼Ñ Ð¿Ñи возможнÑÑ Ð¿Ð¾ÑеÑÑÑ Ð³Ð»Ñбина Ð·Ð°Ð»ÐµÐ³Ð°Ð½Ð¸Ñ Ð±ÑÐ´ÐµÑ Ð¾ÑлиÑаÑÑÑÑ Ð¾Ñ Ð·Ð°Ð´Ð°Ð½Ð½Ð¾Ð¹ моделÑÑ. ÐбÑазÑом ÑвлÑеÑÑÑ Ð¿Ð¾Ð´Ð»Ð¾Ð¶ÐºÐ° из монокÑиÑÑаллиÑеÑкого ниобаÑа лиÑиÑ, поÑÐ¾Ð¼Ñ ÑÑо он ÑаÑе вÑего иÑполÑзÑÑÑ ÐºÐ°Ðº звÑкопÑовод, поÑÐ¾Ð¼Ñ ÑÑо ÑÑо позволÑÐµÑ ÑделаÑÑ Ð¿Ð¾Ð´Ð»Ð¾Ð¶ÐºÑ Ð´Ð¾Ð²Ð¾Ð»Ñно болÑÑой длинÑ. Ð ÑезÑлÑÑаÑе пÑоведенного опÑÑа ÑÑало понÑÑно, за какое вÑÐµÐ¼Ñ Ð¿Ñи возможнÑÑ Ð¿Ð¾ÑеÑÑÑ Ð³Ð»Ñбина Ð·Ð°Ð»ÐµÐ³Ð°Ð½Ð¸Ñ Ð±ÑÐ´ÐµÑ Ð¾ÑлиÑаÑÑÑÑ Ð¾Ñ Ð·Ð°Ð´Ð°Ð½Ð½Ð¾Ð¹ моделÑÑ. ÐлÑбина ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¿Ð¾Ð»ÑÑилаÑÑ Ñавной ~ 600 ± 30 à пÑи вÑемени 1180 Ñ. ÐÑо ÑвлÑеÑÑÑ Ð½Ð°Ð¸Ð»ÑÑÑим ÑезÑлÑÑаÑом пÑи поÑеÑÑÑ Ð² 44 дÐ, пÑи Ñом, ÑÑо макÑималÑное возможное знаÑение â 48дÐ. СледоваÑелÑно, в иÑоге можно ÑделаÑÑ Ð²Ñвод, ÑÑо на пÑакÑике Ñ Ð°ÑакÑеÑиÑÑики моделÑного ваÑианÑа ÑÑÑановки оÑлиÑаÑÑÑÑ Ð¸ вÑегда ÑÑÐ¾Ð¸Ñ ÑÑо ÑÑиÑÑваÑÑ Ð¸ пÑовеÑÑÑÑ. The purpose of the work is the use of ion beam etching in the process of manufacturing an acoustic delay line.In the course of the work, the ion-beam etching method was used in order to check whether the etching depth was correctly declared by the model version of the ion-beam etching installation. To test it, it was necessary to conduct an experiment, namely, to measure signal losses at specified aspects, which just showed how long, with possible losses, the depth of occurrence would differ from the specified model. The sample is a substrate made of monocrystalline lithium niobate, because it is most often used as a sound conductor, because it allows you to make a substrate of a fairly large length.As a result of the conducted experience, it became clear for how long, with possible losses, the depth of occurrence will differ from the specified model. The etching depth turned out to be ~ 600 ± 30 à at a time of 1180 s. This is the best result with a loss of 44 dB, despite the fact that the maximum possible value is 48dB. Consequently, as a result, we can conclude that in practice the characteristics of the model version of the installation are different and it is always worth taking this into account and checking. |
Databáze: | OpenAIRE |
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