Statistical Analysis of Emission Intensity for Silicon Dioxide Etching Using Optical Emission Spectroscopy Data

Autor:	Dong Sun Seo, Sang Jeen Hong, Jin Su Park, Hyun-Wook Kim
Rok vydání:	2009
Předmět:	chemistry.chemical_compound Optics Materials science chemistry Etching (microfabrication) business.industry Silicon dioxide General Physics and Astronomy Statistical analysis Optical emission spectroscopy business Emission intensity
Zdroj:	Journal of the Korean Physical Society. 55:1873-1876
ISSN:	0374-4884
DOI:	10.3938/jkps.55.1873
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d8008feb158985580aba357f4002be10 https://doi.org/10.3938/jkps.55.1873 Zobrazit plný text záznamu