Characteristics of SiOx Thin Films Deposited by Atmospheric Pressure Chemical Vapor Deposition Using Dual Frequency
| Autor: | Elly Gil, JaeBeom Park, Jong Sik Oh, GeunYoung Yeom |
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| Rok vydání: | 2010 |
| Zdroj: | ECS Meeting Abstracts. :1541-1541 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2010-02/22/1541 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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