The Effects of Plasma Treatments and Subsequent Atomic Layer Deposition on the Pore Structure of a k = 2.0 Low-k Material

Autor:	Johan Meersschaut, Guinther Kellerman, S. Gomes dos Santos Filho, M. R. Baklanov, Hilde Tielens, Annelies Delabie, S. Van Elshocht, J. Swerts, Alexis Franquet, A Maheshwari, J. Loyo Prado, Thierry Conard, Akira Uedono, Danilo Roque Huanca, Thomas Witters, Sven Dewilde, Silvia Armini, Pascal Verdonck
Rok vydání:	2013
Předmět:	Atomic layer deposition Materials science Analytical chemistry Plasma Electronic Optical and Magnetic Materials
Zdroj:	ECS Journal of Solid State Science and Technology. 2:N103-N109
ISSN:	2162-8777 2162-8769
DOI:	10.1149/2.007305jss
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d6c9e921ae102fd85380705d94bb617f https://doi.org/10.1149/2.007305jss Zobrazit plný text záznamu