Characterization of Ta–Si–N coatings prepared using direct current magnetron co-sputtering
| Autor: | Hsiu-Hui Wang, Kun-Yi Lin, Yu-Ru Cheng, Yung-I Chen |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Materials science
Silicon Annealing (metallurgy) Metallurgy General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Nanoindentation Condensed Matter Physics Surfaces Coatings and Films Amorphous solid Surface coating X-ray photoelectron spectroscopy Chemical engineering chemistry Sputtering Cavity magnetron |
| Zdroj: | Applied Surface Science. 305:805-816 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2014.04.011 |
| Popis: | Ta–Si–N coatings were prepared using reactive direct current magnetron co-sputtering on silicon substrates. When the sputtering powers and N 2 flow ratio were varied, Ta–Si–N coatings exhibited various chemical compositions and crystalline characteristics. The high-Si-content Ta–Si–N coatings exhibited an amorphous phase in the as-deposited states, whereas the low-Si-content coatings exhibited a face-centered cubic phase or an amorphous phase depending on the N content. This study evaluated the application of amorphous Ta–Si–N coatings, such as the protective coatings on glass molding dies, in high-temperature and oxygen-containing atmospheres for longed operation durations. To explore the oxidation resistance and mechanical properties of the Ta–Si–N coatings, annealing treatments were conducted in a 1%O 2 –99%Ar atmosphere at 600 °C for 4–100 h. The material characteristics and oxidation behavior of the annealed Ta–Si–N coatings were examined using atomic force microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy, and a nanoindentation tester. The Si oxidized preferentially in the Ta–Si–N coatings. The in-diffusion of oxygen during 600 °C annealing was restricted by the formation of an amorphous oxide scale consisting of Si and O. |
| Databáze: | OpenAIRE |
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