Spectroscopic ellipsometric characterization of organic films obtained via organic vapor phase deposition
Autor: | N. Meyer, Michael Heuken, H.-H. Johannes, Cameliu Himcinschi, Wolfgang Kowalsky, Dietrich R. T. Zahn, G. Strauch, Marion Friedrich, S. Hartmann, M. Gersdorff, M. Schwambera |
---|---|
Rok vydání: | 2005 |
Předmět: | |
Zdroj: | Applied Physics A. 80:551-555 |
ISSN: | 1432-0630 0947-8396 |
Popis: | Thin films of Tris(8-hydroxyquinoline)-aluminum(III) (Alq3) and N,N′-Di-[(1-naphthyl)-N,N′-diphenyl]-(1,1′-biphenyl)-4,4′-diamine (α-NPD ) were deposited on large-area silicon substrates by means of the recently developed organic vapor phase deposition (OVPD) method. Variable-angle spectroscopic ellipsometry was used to measure the optical constants of OVPD Alq3 and α-NPD layers in the 0.8–5 eV energy range. The absorption onset which defines the lower limit of the optical band gap was found to be at ∼2.65 eV and ∼2.9 eV for Alq3 and α-NPD , respectively. Additionally, the thicknesses of the layers as well as the thickness profiles of the organic thin films were determined along the 8′′ diameter of the wafers. The thickness analysis revealed large-area uniform deposition of the films. |
Databáze: | OpenAIRE |
Externí odkaz: |