Embedded top-coat for reducing the effect out of band radiation in EUV lithography
| Autor: | Nico Voelcker, Marek Jasieniak, Jim Thackeray, Meiliana Siauw, David Valade, Ke Du, Idriss Blakey, Peter Trefonas, Andrew K. Whittaker |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
business.industry Extreme ultraviolet lithography 02 engineering and technology Photoresist 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences law.invention Optics Resist law Extreme ultraviolet Optoelectronics X-ray lithography Photolithography 0210 nano-technology business Lithography Electron-beam lithography |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| Popis: | Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure |
| Databáze: | OpenAIRE |
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