Designed tools for analysis of lithography patterns and nanostructures
| Autor: | Hanna Grönqvist, Johann Foucher, Sergio Martinez, Alexandre Dervillé, Julien Baderot, Guilhem Bernard, Aurelien Labrosse, Y Zimmermann |
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| Rok vydání: | 2017 |
| Předmět: |
Nanostructure
Computer science business.industry Image processing 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Edge detection Metrology 010309 optics Set (abstract data type) Software Computer architecture 0103 physical sciences 0210 nano-technology business Lithography Simulation |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2258612 |
| Popis: | We introduce a set of designed tools for the analysis of lithography patterns and nano structures. The classical metrological analysis of these objects has the drawbacks of being time consuming, requiring manual tuning and lacking robustness and user friendliness. With the goal of improving the current situation, we propose new image processing tools at different levels: semi automatic, automatic and machine-learning enhanced tools. The complete set of tools has been integrated into a software platform designed to transform the lab into a virtual fab. The underlying idea is to master nano processes at the research and development level by accelerating the access to knowledge and hence speed up the implementation in product lines. |
| Databáze: | OpenAIRE |
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