Dilute aqueous base developable resists for environmentally friendly and biocompatible processes
| Autor: | Constantinos D. Diakoumakos, Ioannis Raptis, Georgia Terzoudi, Antonios M. Douvas, S.E. Kakabakos, Dimitra Dimotikalli, Panagiotis Argitis |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
chemistry.chemical_classification
Acrylate Materials science Aqueous solution Biomolecule Photoresist Condensed Matter Physics Environmentally friendly Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention chemistry.chemical_compound chemistry Resist law Polymer chemistry Copolymer Electrical and Electronic Engineering Photolithography |
| Zdroj: | Microelectronic Engineering. :819-827 |
| ISSN: | 0167-9317 |
| Popis: | Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acrylate copolymers bearing either pendant t-butyl ester group or 2-hydroxylethyl ester group for positive and negative imaging, respectively. Characteristic high-resolution lithographic results (0.13 μm lines) obtained with a positive (meth)acrylate-based chemically amplified resist formulation upon development with 13 × 10 -3 M TMAH solution are presented. On the other hand, a slightly modified resist formulation was used for biomolecule patterning under biocompatible conditions and protein microstructures ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect