Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium

Autor:	Harald Suhr, P. Ŝpatenka, K. Wiesemann, M. Petig
Rok vydání:	1995
Předmět:	Electron density Range (particle radiation) Argon Hydrogen General Chemical Engineering Analytical chemistry chemistry.chemical_element General Chemistry Chemical vapor deposition Electron Plasma Condensed Matter Physics Surfaces Coatings and Films symbols.namesake chemistry symbols Langmuir probe
Zdroj:	Plasma Chemistry and Plasma Processing. 15:371-381
ISSN:	1572-8986 0272-4324
DOI:	10.1007/bf01650735
Popis:	A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrogen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and an increase in the mean electron energr. Whereas a transition front the a-mode to the γ-mode has been observed with power rise in the Ar/H2 plasmas without precursor, in the presence of the precursor the plasota α-mode remained unchanged in the power range investigated.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d5c0494ee038a2b977ee6143b5312746 https://doi.org/10.1007/bf01650735 Zobrazit plný text záznamu Full text from SpringerLink