Evaluation of UV-curability of Photo-curable Materials for Acid Free Pressure Sensitive Adhesive

Autor: Ji-won Park, Sueng=woo Lee, Young-Min Yoo, Hyun-Woo Chung, Won-Bum Jang, Hyu-Joong Kim
Rok vydání: 2011
Předmět:
Zdroj: Journal of Photopolymer Science and Technology. 24:553-560
ISSN: 1349-6336
0914-9244
DOI: 10.2494/photopolymer.24.553
Popis: In general, pressure-sensitive-adhesive (PSA) is distinct from commonly used an adhesive material. There are many useful benefits, PSA are applied in many fields. A using of PSA are expanding on electrical and electronic product, especially PSA are used as a very important material in the field of touch screen panel (TSP). PSA is posted a indium tin oxide (ITO) films that patterned ITO layer. To preserve the layer, the existing PSA which contains acid are replaced by acid-free PSA. In order to synthesize acid free PSA, acrylic acid (AA) is replaced by the 2-ethylhexyl acrylate (2-HEA), glycidyl methacrylate (GMA) and isobonyl acrylate(IBA). To improve cohesion of acid-free PSA, two different methods, - self-crosslinking system and IPNs-system-, are introduced. Self-crosslinking system is hard method compared to the IPNs-system, but there is no residue and the system showed excellent properties.
Databáze: OpenAIRE