| Autor: |
Feby Jose, Srinivasu Kunuku, R. Ramaseshan, S. Dash, A. K. Tyagi, Alka B. Garg, R. Mittal, R. Mukhopadhyay |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings. |
| ISSN: |
0094-243X |
| DOI: |
10.1063/1.3606085 |
| Popis: |
Titanium Aluminum Nitride (Ti1−xAlxN) thin films with different Al concentrations (64 & 81%) were deposited on SS substrate by reactive magnetron co–sputtering. GIXRD result shows that it has NaCl type crystal structure. Adhesion strength of Ti1−xAlxN with 81% Al (3 N) is higher than the 64% (1.4 N) because it is softer than the later. The average surface hardness of these films was measured as 34 and 30 GPa, respectively. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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