Oxygen additive effects on decomposition rate of poly(vinyl phenol)-based polymers using hydrogen radicals produced by a tungsten hot-wire catalyst
| Autor: | Masashi Yamamoto, Hironobu Umemoto, Hideo Horibe, Keisuke Ohdaira, Shiro Nagaoka |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
chemistry.chemical_classification Materials science Metals and Alloys chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces Polymer Tungsten Photoresist 021001 nanoscience & nanotechnology 01 natural sciences Oxygen Decomposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Catalysis chemistry.chemical_compound chemistry Chemical engineering 0103 physical sciences Materials Chemistry Side chain Phenol 0210 nano-technology |
| Zdroj: | Thin Solid Films. 679:22-26 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2019.03.035 |
| Popis: | For fabricating semiconductor devices and for microelectromechanical systems, photoresists are important materials supporting photolithography processes. However, photoresists must be removed for subsequent processes. An earlier study demonstrated that adding a small amount of oxygen gas to the atmosphere in which hydrogen radicals are produced increased the decomposition rate of a positive-tone novolac photoresist. For this study, we prepared polymers with different side chain structures based on poly(vinyl phenol) (PVP). We examined the effects of added oxygen and the oxygen-added hydrogen radicals on the decomposition rates of PVP-based polymers. Hydroxyl groups of PVP are partly substituted with tert-butoxycarbonyl groups in order to use for base polymer of KrF photoresist. Results show that oxygen addition can be useful for KrF photoresist removal. |
| Databáze: | OpenAIRE |
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