| Autor: |
Robert J. Hillard, Robert G. Mazur, L. E. Peitersen, Richard Conti, R. H. Herlocher, G. A. Gruber |
| Rok vydání: |
1998 |
| Předmět: |
|
| Zdroj: |
The 1998 international conference on characterization and metrology for ULSI technology. |
| DOI: |
10.1063/1.56907 |
| Popis: |
This paper reports the use of a mercury probe with a highly repeatable contact area to monitor the effects of plasma damage on a gate oxide resulting from a PECVD process. The advantage of the mercury probe is that no processing is required to form the gate, allowing measurements to be made on plain oxidized wafers immediately before and after plasma exposure. The Hg probe provides a sensitive and rapid method for monitoring plasma damage without the need for antenna structures. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
