Properties of amorphous carbon nitride a-CN films prepared by the layer-by-layer method
| Autor: | T. Katsuno, Shoji Nitta |
|---|---|
| Rok vydání: | 2003 |
| Předmět: |
Chemistry
Mechanical Engineering Layer by layer Analytical chemistry General Chemistry Sputter deposition Nitride Electronic Optical and Magnetic Materials Amorphous solid Amorphous carbon X-ray photoelectron spectroscopy Sputtering Materials Chemistry Electrical and Electronic Engineering Thin film |
| Zdroj: | Diamond and Related Materials. 12:1887-1890 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/s0925-9635(03)00316-9 |
| Popis: | Amorphous carbon nitride a-CNx films prepared by a nitrogen radical sputter method show high photosensitivity PS=σp/σd, which is the ratio of photoconductivity σp and dark-electrical conductivity σd. In particular, PS of a-CNx prepared by a layer-by-layer LLa-CNx method, is large compared with that of usual a-CNx. The layer-by-layer LL method, is a cyclic process of a deposition by a nitrogen radical sputter and an atomic hydrogen treatment. It is very important to find clearly the reason for the change of properties by LL method. Therefore, we studied and discussed the characteristics of LLa-CNx comparing with those of a-CNx using the results of X-ray photoelectron spectroscopy, electron spin resonance and optical transmittance spectra. |
| Databáze: | OpenAIRE |
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