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The paper describes the main features of the pulsed low-pressure gas discharge in oxygen and xenon, which bums intypical conditions of EUV source operation. It is shown that in a mode of the superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression ofthe plasma column.Keywords: EUV radiation, pseudospark discharge, dense glow discharge, superdense glow discharge, arc 1.INTRODUCTION The problem of generation of EUV and soft X-ray radiation is traditionally solved using a plasma focus method, a capillary discharge or a gas puff Z pinch with a rather high energy stored in a primary capacitor bank (larger than 1 kJ). On the other hand, in connection with EUV lithography at a wavelength of about 13 nm, considerable interest has recently been displayed in the installations with a moderate energy in a single pulse capable of working with a high pulserepetition rate. One of the new approaches is application of a pseudospark electrode system, or strictly to say, the high |
