| Autor: |
Yung-Sheng Lin, Tsung-Cheng Chen, Jung-Ching Wang, Chen Shian-Wen, Chen-Hao Ku, Jui-Yi Hung, Ching-Chang Wen, Jen-Jiang Lee |
| Rok vydání: |
2014 |
| Předmět: |
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| Zdroj: |
2014 IEEE 40th Photovoltaic Specialist Conference (PVSC). |
| DOI: |
10.1109/pvsc.2014.6924997 |
| Popis: |
AlO x provides excellent passivation on p-type silicon surface and has successfully implemented to high efficiency Passvated Emitter and Rear Cell (PERC) solar cells in recent years. Generally, AlO x is deposited by using plasma enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD). In our work, in contrast, a novel printable AlO x paste is applied to form rear passivation layer of PERC cells. In this paper, we focus on illustrating the effect of post deposition annealing (PDA) on PERC cells. Using proper PDA, an average efficiency of 20.0% with the best efficiency of 20.1% is achieved. It demonstrates the feasibility of using this printable AlO x paste. And more important is that this printable AlO x paste can be easily integrated to existing production line with minimum additional capital cost for equipment. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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