Deposition of a-Si: H films by ECR plasma CVD using large diameter multi-slot antennae
| Autor: | Hideaki Teranishi, Yoshinobu Kawai, Masayoshi Tanaka, Shunjiro Shinohara, Yoko Ueda |
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| Rok vydání: | 1995 |
| Předmět: |
Materials science
Silicon Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Plasma Condensed Matter Physics Electron cyclotron resonance Surfaces Coatings and Films Magnetic field Magnetic mirror chemistry Physics::Plasma Physics Saturation current Materials Chemistry Deposition (phase transition) Thin film |
| Zdroj: | Surface and Coatings Technology. :503-507 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/0257-8972(95)08253-0 |
| Popis: | A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation current was examined as a function of input microwave power, gas pressure and magnetic mirror coil current to determine the experimental conditions necessary for a large diameter and uniform plasma at low pressure. Furthermore, the deposition of a-Si: H films was attempted onto 8 inch glass substrates using a gas mixture SiH 4 -10% He. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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