Admittance spectroscopic analysis of organic light emitting diodes with the CFX plasma treatment on the surface of indium tin oxide anodes

Autor:	Sunyoung Sohn, Semyoung Oh, Sungi Jang, Kwangsoo Lee, Hyung Jun Park, Heeyeop Chae, J. Yi, Hyunmin Kim, Donggeun Jung, J.H. Lee
Rok vydání:	2008
Předmět:	Contact resistance Metals and Alloys Analytical chemistry Lithium fluoride Surfaces and Interfaces Semiconductor device Tin oxide Surfaces Coatings and Films Electronic Optical and Magnetic Materials Indium tin oxide Anode chemistry.chemical_compound chemistry Electrode Materials Chemistry OLED
Zdroj:	Thin Solid Films. 516:1370-1373
ISSN:	0040-6090
Popis:	Admittance spectroscopic analysis was used to examine the effect of a CF X plasma surface treatment on indium tin oxide (ITO) anodes using CF 4 gas and model the equivalent circuit for organic light emitting diodes (OLEDs) with the of ITO anode surface treated with CF X plasma. This device with the ITO/ N , N ′-diphenyl- N , N ′-bis(3-methylphenyl)-1,1′-diphenyl-4,4′-diamine/tris-(8-hydroxyquinoline) aluminum/lithium fluoride/Al structure was modeled as a simple combination of two resistors and a capacitor. The ITO anode surface treated with the CF X plasma showed a shift in the vacuum level of the ITO, which resulted in a decrease in the barrier height for hole injection at the ITO/organic interface. Admittance spectroscopy measurements of the devices with the CF X plasma treatment on the surface of the ITO anodes showed a change in the contact resistance, bulk resistance and bulk capacitance.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d30ef59ae264d8caa389377867a6c5f5 https://doi.org/10.1016/j.tsf.2007.07.178 Zobrazit plný text záznamu Full Text from ScienceDirect