Assessing Form-Dependent Optical Scattering at Vacuum- and Extreme-Ultraviolet Wavelengths of Nanostructures with Two-Dimensional Periodicity
| Autor: | Martin Y. Sohn, Richard M. Silver, Mark-Alexander Henn, Bryan M. Barnes, Hui Zhou |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Nanostructure Birefringence Yield (engineering) business.industry Finite difference method General Physics and Astronomy 02 engineering and technology 021001 nanoscience & nanotechnology Chip 01 natural sciences Light scattering Wavelength Optics Extreme ultraviolet 0103 physical sciences 010306 general physics 0210 nano-technology business |
| Zdroj: | Physical Review Applied. 11 |
| ISSN: | 2331-7019 |
| DOI: | 10.1103/physrevapplied.11.064056 |
| Popis: | In an industrial setting, only optical methods are fast enough to tease out the killer defects that may render a computer chip inoperable. Comprised of billions of periodic nanoelectronic devices, they yield optical responses like form birefringence, even for deep-ultraviolet (DUV) light. This study reveals how the form-dependent optical response changes as the wavelength approaches the periodicity, by realistically comparing five wavelengths numerically. Surprising results are obtained at 47 nm. Similarly optimizing sets of wavelengths, materials, and their optical constants may even foster improved optical materials in the far-ultraviolet regime. |
| Databáze: | OpenAIRE |
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