Examination of thin films in the ZrO2–SiO2 system by transmission electron microscopy and x‐ray diffraction techniques

Autor:	A. Feldman, Y. N. Sun, J. Sun, E. N. Farabaugh
Rok vydání:	1987
Předmět:	Diffraction Materials science Analytical chemistry Surfaces and Interfaces Condensed Matter Physics Microstructure Electron beam physical vapor deposition Surfaces Coatings and Films Amorphous solid Crystallography Transmission electron microscopy X-ray crystallography Crystallite Thin film
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 5:1671-1674
ISSN:	1520-8559 0734-2101
Popis:	The microstructure of thin films of ZrO2 and ZrO2–SiO2 formed by electron‐beam coevaporation have been examined by x‐ray diffraction and transmission electron microscopy. Results of these examinations suggest that films composed of 100% ZrO2 grow by the formation of tapered polycrystalline columns. Near the substrate the columns are of small diameter and contain a single crystalline phase, but at increasing distances from the substrate the column diameters increase and material with two crystalline phases occurs. Small additions of SiO2 to the film composition result in a smaller column diameter at a given distance from the substrate. Films with greater than 30% SiO2 by volume, which earlier had been shown to display an amorphous x‐ray diffraction pattern, have been shown to display an amorphous electron diffraction pattern as well. The surfaces of the amorphous films are nearly featureless and are significantly smoother than the surfaces of 100% ZrO2 films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d2a2dc8e00ba6fad5cd604e05ff6c9e5 https://doi.org/10.1116/1.574544 Zobrazit plný text záznamu