Investigating of SER in 28 nm FDSOI-Planar and Comparing with SER in Bulk-FinFET
Autor: | Seungbae Lee, Taiki Uemura, Hai Jiang, Tae-Young Jeong, Sangwoo Pae, Hwa-Sung Rhee, Shota Ohnishi, Ki-il Hong, Byungjin Chung, Yongsung Ji, Jeongmin Jo, Eun-Cheol Lee, Park Young-In, Jaehee Choi, Rakesh Ranjan, Ken Machida |
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Rok vydání: | 2020 |
Předmět: | |
Zdroj: | IRPS |
DOI: | 10.1109/irps45951.2020.9129644 |
Popis: | This paper investigates soft error in memories and logic circuits in 28 nm planar-FDSOI technology by neutron, alpha, proton, and gamma-ray irradiation tests, and compares with SER in bulk-FinFET. The comparison elucidates the different SER trends between planar-FDSOI and bulk-FinFET. |
Databáze: | OpenAIRE |
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