Investigating of SER in 28 nm FDSOI-Planar and Comparing with SER in Bulk-FinFET

Autor: Seungbae Lee, Taiki Uemura, Hai Jiang, Tae-Young Jeong, Sangwoo Pae, Hwa-Sung Rhee, Shota Ohnishi, Ki-il Hong, Byungjin Chung, Yongsung Ji, Jeongmin Jo, Eun-Cheol Lee, Park Young-In, Jaehee Choi, Rakesh Ranjan, Ken Machida
Rok vydání: 2020
Předmět:
Zdroj: IRPS
DOI: 10.1109/irps45951.2020.9129644
Popis: This paper investigates soft error in memories and logic circuits in 28 nm planar-FDSOI technology by neutron, alpha, proton, and gamma-ray irradiation tests, and compares with SER in bulk-FinFET. The comparison elucidates the different SER trends between planar-FDSOI and bulk-FinFET.
Databáze: OpenAIRE