Autor: |
Atsushi Okamoto, Arata Ashihara, Takayuki Akaogi, Ichiro Shibasaki |
Rok vydání: |
2001 |
Předmět: |
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Zdroj: |
Journal of Crystal Growth. :619-624 |
ISSN: |
0022-0248 |
DOI: |
10.1016/s0022-0248(01)00784-9 |
Popis: |
InSb thin films were grown on GaAs (1 0 0) substrates by molecular beam epitaxy (MBE). N-type impurity (Sn and Si) doping of InSb was investigated for the purpose of reducing its temperature dependence of resistivity. It was found that stable Sn-doped InSb thin films with large electron mobility (4.5×10 4 cm 2 /V s) and sheet electron concentration (7.2×10 12 cm −2 ) can be fabricated. Magneto-resistance (MR) devices using these films show a large enough MR effect and an extremely small temperature dependence of resistance. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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