Effect of NbN and ZrN films formed by magnetron sputtering on Ti and porcelain bonding
| Autor: | Labao Zhang, Han-bing Guang, Shu-shu Wang, Yang Xia, Ming Shen, Fei-Min Zhang |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Materials science
Niobium nitride Scanning electron microscope Metallurgy chemistry.chemical_element Surfaces and Interfaces General Chemistry Zirconium nitride Sputter deposition Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound chemistry Sputtering Physical vapor deposition Cavity magnetron Materials Chemistry Composite material Titanium |
| Zdroj: | Surface and Coatings Technology. 205:1886-1891 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2010.08.066 |
| Popis: | Niobium nitride (NbN) and zirconium nitride (ZrN) were deposited on Ti substrates by direct-current (DC) reactive magnetron sputtering; the deposited NbN and ZrN films served as intermediate layers of a Ti and porcelain interface. X-ray diffraction (XRD) results proved that the deposited NbN and ZrN films were polycrystalline with a cubic microstructure. The Ti and porcelain bonding strength of the samples in Group Control (27.2 ± 0.75 MPa), Group NbN (43.1 ± 0.59 MPa), and Group ZrN (52.4 ± 0.80 MPa) were measured. The surface roughness in the case of Group Control (1.863 ± 0.10 μm), Group NbN (2.343 ± 0.07 μm), and Group ZrN (2.346 ± 0.10 μm) was also investigated. Statistical analysis showed that both films helped improve the Ti and porcelain bonding strength and increase the surface roughness. Scanning electron microscopy (SEM) results showed that no apparent oxide layer was formed at the Ti and porcelain interface in both Group NbN and Group ZrN. Energy-dispersive X-ray spectroscopy (EDS) results showed that ZrN was more effective in preventing Ti oxidation than was NbN. Overall, the experimental results showed that the deposition of both NbN and ZrN films helps improve the Ti and porcelain bonding strength and that ZrN films are more effective. |
| Databáze: | OpenAIRE |
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