Simultaneous optimization of short-channel effects and junction capacitance in pMOSFET using large-angle-tilt-implantation of nitrogen (LATIN)

Autor:	C. S. Murthy, Suryanarayan G. Hegde, Rajarao Jammy, Kil-Ho Lee, Rajesh Rengarajan
Rok vydání:	2002
Předmět:	Materials science business.industry Doping Electrical engineering Diffusion capacitance Capacitance Electronic Optical and Magnetic Materials Tilt (optics) Ion implantation CMOS MOSFET Optoelectronics Halo Electrical and Electronic Engineering business
Zdroj:	IEEE Electron Device Letters. 23:547-549
ISSN:	1558-0563 0741-3106
DOI:	10.1109/led.2002.801324
Popis:	A widely used halo implant process of counter doping has a tradeoff between the short channel effects and the parasitic junction capacitance. In this letter, we propose a novel drain engineering concept, large-angle-tilt-implantation of nitrogen (LATIN) to improve the short-channel effects without the increase of the junction capacitance in the buried-channel pMOSFET using sub-0.25-/spl mu/m CMOS technology. We compare the electrical characteristics of devices fabricated using LATIN, a conventional arsenic halo implant process (As HALO), and BF/sub 2//sup +/ source/drain (S/D) implantation only. The LATIN improves the short-channel effects when compared to the case of BF/sub 2//sup +/ S/D implant only. In addition, the LATIN reduces junction capacitance by 18% when compared to As HALO. As a consequence, the LATIN is shown to be a drain engineering concept to simultaneously optimize the short-channel effects and junction capacitance. Calibrated two-dimensional simulations confirm the improvement with LATIN.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d1bed77ead733802cdf01304248aa5ec https://doi.org/10.1109/led.2002.801324