Deposition Process Optimization of Zinc Oxide Films with Inclined Texture Axis
| Autor: | V. A. Luzanov, Natalia Polzikova, S. G. Alekseev |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Radiation Fabrication Materials science chemistry.chemical_element 02 engineering and technology Substrate (electronics) Zinc 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Electronic Optical and Magnetic Materials Ion chemistry Position (vector) Sputtering 0103 physical sciences Texture (crystalline) Electrical and Electronic Engineering Composite material 0210 nano-technology Intensity (heat transfer) |
| Zdroj: | Journal of Communications Technology and Electronics. 63:1076-1079 |
| ISSN: | 1555-6557 1064-2269 |
| Popis: | The optimization of technological parameters for fabrication of the inclined texture [0001] in ZnO films has been conducted. It is shown that the inclination of the texture axis is determined by at least two factors: the average vector of falling the deposited particles and the intensity of bombardment of the growing film with negative ions of oxygen. Optimum displacements of the substrate position relative to the axis of the sputtering system and the distance between the planes of the target and the substrate are determined. Films of zinc oxide with optimum angles of inclination of texture axis have been obtained by the RF sputtering technique. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink