Optically pumped InGaN/GaN MQW lift-off lasers grown on silicon substrates
| Autor: | G. P. Yablonskii, Michael Heuken, Rolf H. Jansen, L. Rahimzadeh Khoshroo, V. N. Pavlovskii, Evgenii V. Lutsenko, Y. Dikme, N. P. Tarasuk, Bernd Schineller, A. V. Danilchyk, A. L. Gurskii, Holger Kalisch |
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| Rok vydání: | 2007 |
| Předmět: |
Materials science
Silicon Physics::Instrumentation and Detectors business.industry Physics::Optics chemistry.chemical_element Heterojunction Substrate (electronics) Condensed Matter Physics Laser Isotropic etching law.invention chemistry law Optoelectronics General Materials Science Metalorganic vapour phase epitaxy Electrical and Electronic Engineering business Luminescence Lasing threshold |
| Zdroj: | Superlattices and Microstructures. 41:400-406 |
| ISSN: | 0749-6036 |
| Popis: | Chemical etching and removal of the silicon substrate was used for the creation of optically pumped lift-off InGaN/GaN multiple quantum well (MQW) lasers from heterostructures grown on silicon substrate by MOVPE. Luminescence and laser properties of these heterostructures on silicon substrates as well as those of MQWs lifted-off from their substrate by chemical etching were investigated. The lowest value of the lasing threshold of the lift-off lasers at room temperature was about 205 kW/cm2 for a laser wavelength of 463 nm and about 360 kW/cm2 for a wavelength of 475 nm. It was shown theoretically that the reduction of internal losses, caused by the absence of absorption in the substrate (resulting from its removal) is most significant for the high order modes having lower values of mirror losses and can lead to a 50% reduction of the threshold (or material gain in InGaN necessary to achieve the threshold). |
| Databáze: | OpenAIRE |
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