Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns

Autor:	Stacey F. Bent, Tzu-Ling Liu
Rok vydání:	2021
Předmět:	chemistry.chemical_compound Atomic layer deposition Materials science chemistry Chemical engineering General Chemical Engineering Materials Chemistry Oxide General Chemistry Substrate (printing) Selectivity
Zdroj:	Chemistry of Materials. 33:513-523
ISSN:	1520-5002 0897-4756
Popis:	Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest, but the process usually requires substrate materials with substantially different chemical properties. We introduc...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d182d1aa5c79c54b8cd9baa9008180f9 https://doi.org/10.1021/acs.chemmater.0c03227 Zobrazit plný text záznamu