Atomic layer deposition of high-k dielectrics on carbon nanoparticles
| Autor: | Lauri Aarik, Aleks Aidla, Jekaterina Kozlova, Jaan Aarik, Kaupo Kukli, Jun Lu, Lars Hultman, Anna-Liisa Peikolainen, Mihkel Koel, Hugo Mändar, Kaspar Roosalu, Aile Tamm, Raul Rammula |
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| Rok vydání: | 2013 |
| Předmět: |
Materials science
Inorganic chemistry Metals and Alloys Oxide chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Atomic layer deposition chemistry.chemical_compound Carbon film chemistry Materials Chemistry Aluminium oxide Thin film 0210 nano-technology Silicon oxide Layer (electronics) Carbon |
| Zdroj: | Thin Solid Films. 538:16-20 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2012.09.071 |
| Popis: | Carbon nanoparticles were synthesized from 5-methylresorcinol and formaldehyde via base catalysed polycondensation reaction and distributed over silicon oxide wafers and aluminium oxide thin films. These particles essentially possessed monocrystalline graphite structure. The particles were covered by hafnium oxide thin films in metal chloride based atomic layer deposition process carried out at 300 °C. Upon deposition of HfO2, thin crystalline metal oxide layer containing mostly cubic phase was formed. At the same time, deposition of the metal oxide caused reduction of the sizes of graphite particles and essential increase in the disorder in carbon. |
| Databáze: | OpenAIRE |
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