Characteristics of hydrolyzed layer and contamination on fused silica induced during polishing
| Autor: | Zhe Zhang, Ruiqing Xie, Xianhua Chen, Defeng Liao, Tang Caixue |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Materials science
Dopant Process Chemistry and Technology Mineralogy Polishing Contamination Focused ion beam Surfaces Coatings and Films Electronic Optical and Magnetic Materials Field emission microscopy Hydrolysis Chemical engineering Materials Chemistry Ceramics and Composites Relative density Layer (electronics) |
| Zdroj: | Ceramics International. 40:4479-4483 |
| ISSN: | 0272-8842 |
| Popis: | Optical polishing is a chemo-mechanical process which can induce a near-surface hydrolyzed layer with contamination. To date, it is not clear whether the contaminants in the hydrolyzed layer are present as a uniform dopant or as discrete particles. The purpose of the present work is to try to clarify this contamination form. A field emission scanning electron microscope (FE-SEM) was used to determine the micro-topography and composition mapping of the polished fused silica. The relative density of the hydrolyzed layer and the bulk has been assessed using a combination of focused ion beam (FIB) milling and FE-SEM. The results suggest that the dopant contamination is located in the upper layer (tens of nm thick), which has a lower density compared to the bulk. Also, discrete contaminant ‘islands’ are present in the hydrolyzed layer. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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