| Autor: |
Uwe Stamm, Juergen Kleinschmidt, Rainer Paetzel, Thomas Schroeder, Igor Bragin, Peter Lokai, Wolfgang Zschocke, Martin Sprenger, Rustem Osmanov |
| Rok vydání: |
2000 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
Results on the feasibility of highest repetition rate ArF lithography excimer lasers with narrow spectral bandwidth of less than 0.4 pm are presented. The current 193 nm lithography laser product NovaLine A2010 delivers output power of 10W at 2 kHz repetition rate with energy dose stability of +/- 0.5 percent. A novel 193 nm absolute wavelength calibration technique has ben incorporated in the laser which gives absolute wavelength accuracy better than 0.5 pm. Long-term results of optical materials, coatings and laser components give insight into estimated cost of ownership developments for the laser operation over the next years. Progress in pulse stretching approaches to achieve lower stress of the wafer scanner illumination optics and lens allow optimistic estimates of total system CoO. Initial results on the laser operation at 4 kHz in order to reach 20W output power are discussed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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