Using Megasonics for Particle and Residue Removal in Single Wafer Cleaning

Autor:	Dennis Yost, Steven Verhaverbeke, Roman Gouk
Rok vydání:	2005
Předmět:	Residue (chemistry) Materials science General Materials Science Nanotechnology Wafer Condensed Matter Physics Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :151-154
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.103-104.151
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::d064b2c38e4581de17c1a982bf862b9e https://doi.org/10.4028/www.scientific.net/ssp.103-104.151 Zobrazit plný text záznamu