A Versatile LPCVD Silicon Nitride Platform For Heterogenous Photonic Circuits: Ultra Tight Thickness Control And Low Propagation Loss
| Autor: | Andrea Firrincieli, Ph. Helin, A. Ray Chaudhuri, Nga P. Pham, Haris Osman, Silvia Lenci, Manuel Mannarino |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
business.industry 02 engineering and technology Chemical vapor deposition 021001 nanoscience & nanotechnology 01 natural sciences Layer thickness 010309 optics chemistry.chemical_compound Silicon nitride chemistry 0103 physical sciences Optoelectronics Photonics 0210 nano-technology business Electronic circuit |
| Zdroj: | OECC/PSC |
| DOI: | 10.23919/ps.2019.8818059 |
| Popis: | This paper reports state-of-the-art values for a 200mm LPCVD silicon nitride platform in terms of layer thickness control; 1nm for a silicon nitride thickness of 400nm with low propagation loss 0.13dB/cm at 1520nm. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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