Effect of Photo-active Compound Structure on Photosensitivity of Positive Photosensitive Polyimide
| Autor: | Tae Sung Kim, Young-Ho Kim, Jae Hyun Kim, Masao Tomikawa, Tomoyuki Yuba, Gentaro Ohbayashi |
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| Rok vydání: | 2006 |
| Předmět: |
Materials science
Polymers and Plastics business.industry Organic Chemistry 02 engineering and technology 021001 nanoscience & nanotechnology Photochemistry 020401 chemical engineering Photosensitivity Rate measurement Active compound Materials Chemistry Optoelectronics 0204 chemical engineering 0210 nano-technology business Polyimide |
| Zdroj: | High Performance Polymers. 18:603-615 |
| ISSN: | 1361-6412 0954-0083 |
| DOI: | 10.1177/0954008306068141 |
| Popis: | The photo-active compound (PAC) in positive tone photosensitive polyimide (posi PSPI) was investigated in order to obtain good photo lithographic performance (small development loss and good photosensitivity). When the PAC structure was changed posi PSPI showed different levels of photosensitivity and development loss. The development loss and photosensitivity showed a good correlation. The lower development loss posi PSPI showed lower photosensitivity. From the molecular orbital calculation, the PAC in the lower development loss posi PSPI had a lower dipole moment than that in the larger development loss posi PSPI. In addition, dissolution rate measurement (DRM) results suggest that posi PSPI may have two layers from the point of dissolution. The dissolution rate of the surface layer in posi PSPI was shown to be lower than that of a bottom layer. This suggests that PAC using the lower development loss posi PSPI may exist mainly on its surface. These results are quite important for the design of good posi PSPI. |
| Databáze: | OpenAIRE |
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