Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis
| Autor: | Jiun-Ruey Chen, James R. Engstrom, Michael A. DiFeo, Rambert K. Nahm, Wenyu Zhang |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
010302 applied physics
business.industry Chemistry Flow (psychology) Analytical chemistry 02 engineering and technology Surfaces and Interfaces Substrate (electronics) Computational fluid dynamics 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films Characterization (materials science) Atomic layer deposition Volume (thermodynamics) Chemical engineering 0103 physical sciences Fluid dynamics Microreactor 0210 nano-technology business |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35:061604 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.4996553 |
| Popis: | The authors report the design and characterization of a microreactor probe that enables gas-phase reactions such as atomic layer deposition (ALD) at low-to-medium vacuum, which is coupled directly to an ultrahigh vacuum (UHV) analysis chamber for subsequent in situ surface characterization without an air break. Avoiding this air break is critical to developing a complete understanding of the growth of ultrathin films, particularly in the early stages of growth. Making use of a precisely defined gap between the microreactor probe and the substrate surface, the reactants are well confined in the reaction zone (total volume ∼1 cm3) by the use of “curtain gas” flow. Computational fluid dynamics was used to simulate both the steady-state and transient operations of the microreactor and the surrounding UHV chamber in which fluid flow, heat transport, and mass transport were considered. The authors provide two examples of the efficacy of the design by considering exposure of a Cu substrate to I2(g) vapor, and co... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|