Morphological, Structural and Electronic Damage on InAs and InSb Surfaces Induced by (Reactive) Ion Beam Etching

Autor:	G. Lippold, A. Schindler, F. Bigl, F. Frost
Rok vydání:	2000
Předmět:	Radiation Materials science Ion beam business.industry Analytical chemistry Condensed Matter Physics symbols.namesake Etching (microfabrication) Reactive ion beam etching symbols Optoelectronics General Materials Science business Raman spectroscopy
Zdroj:	Defect and Diffusion Forum. :127-146
ISSN:	1662-9507
DOI:	10.4028/www.scientific.net/ddf.183-185.127
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cf7a29b08f275af4a8a6e1b755ffc849 https://doi.org/10.4028/www.scientific.net/ddf.183-185.127 Zobrazit plný text záznamu