Influence of substrates and rutile seed layers on the assembly of hydrothermally grown rutile TiO 2 nanorod arrays
Autor: | Berit H. Goodge, Julian Kalb, Claudia Simone Plüisch, Emily Chua, Daniela Lehr, Melanie Gerigk, Lukas Schmidt-Mende, Bastian Trepka, Alexander Wittemann, James A. Dorman, Sebastian Polarz, Christina Scheu, Alena Folger, Vanessa Knittel |
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Rok vydání: | 2018 |
Předmět: |
Materials science
02 engineering and technology Substrate (electronics) Hybrid solar cell Sputter deposition 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Evaporation (deposition) 0104 chemical sciences Inorganic Chemistry Chemical engineering Rutile Materials Chemistry Nanorod 0210 nano-technology Layer (electronics) Seed crystal |
Zdroj: | Journal of Crystal Growth. 494:26-35 |
ISSN: | 0022-0248 |
DOI: | 10.1016/j.jcrysgro.2018.05.004 |
Popis: | Rutile TiO 2 nanorod arrays (NRAs) are applicable in various prospective technologies. Hydrothermal methods present a simple technique to fabricate such NRAs. In this report, we present the fabrication of seed layers for the hydrothermal growth of rutile TiO 2 nanorods via sputter deposition, electron-beam evaporation, and sol-gel method and study the influence of each on the growth behavior. To satisfy the requirements of numerous applications, p-type silicon, platinum, levitating carbon membranes, a template made of polystyrene spheres, and commercial fluorine tin oxide (FTO) were employed as substrates. We document the structural properties of the TiO 2 seed layers and describe the relationship between the characteristics of the seed crystals, the growth evolution, and the appearance of as-grown nanorods. Various growth stages of rutile TiO 2 nanorods are compared depending on whether they are grown on polycrystalline TiO 2 or FTO seed layers. In both cases, a homogenous TiO 2 bottom layer is formed at the seed layer/substrate interface, which is essential for electronic applications such as hybrid solar cells. Detached NRAs illustrate the effect of rutile FTO and TiO 2 on the porosity of this bottom layer. Further details about the formation process of this layer are obtained from the growth on confined seed layers fabricated by electron-beam lithography. |
Databáze: | OpenAIRE |
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