Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread
| Autor: | Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali |
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| Rok vydání: | 2021 |
| Zdroj: | 2021 28th IEEE International Conference on Electronics, Circuits, and Systems (ICECS). |
| DOI: | 10.1109/icecs53924.2021.9665465 |
| Databáze: | OpenAIRE |
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