Enhancement of fluorine doped amorphous carbon thin films from microwave surface wave plasma activated above room temperature
| Autor: | Sudip Adhikari, Masayoshi Umeno, Dilip Chandra Ghimire, Golap Kalita, Hare Ram Aryal |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
Chemistry
Mechanical Engineering technology industry and agriculture Analytical chemistry General Chemistry Chemical vapor deposition Fourier transform spectroscopy Electronic Optical and Magnetic Materials symbols.namesake Carbon film X-ray photoelectron spectroscopy Amorphous carbon Materials Chemistry symbols Electrical and Electronic Engineering Fourier transform infrared spectroscopy Thin film Raman spectroscopy |
| Zdroj: | Diamond and Related Materials. 18:465-468 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/j.diamond.2008.10.006 |
| Popis: | Fluorinated amorphous carbon (a-C:F) thin films were synthesized above room temperature by microwave surface wave plasma chemical vapour deposition (MW SWP CVD). The effect of deposition temperature on optical, electrical, chemical and bonding properties of the a-C:F films were studied by ultraviolet–visible spectroscopy (UV–VIS), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectrometry (XPS), Raman spectrometry and TEM measurements. The film exhibits high transparency and decrease in optical band gap with increasing deposition temperature. FTIR study shows the increase in C C and decrease in C–Fx bonds of the films with increasing deposition temperature. Raman study shows some important structural changes in the films due to fluorine incorporation. XPS result shows the shift of carbon peak to higher binding energy due to carbon fluorine link to the films. TEM shows the increasing graphitic layer in the films with increasing deposition temperature. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect