Profile of implanted in potassium titanyl phosphate by the , C nuclear reaction

Autor:	Wei Wang, Qingming Lu, Pei-Jun Ding, Zheng-Gang Yu, Bo-Rong Shi, William A. Lanford, Ke-Ming Wang
Rok vydání:	1998
Předmět:	Nuclear reaction Acoustics and Ultrasonics Chemistry Radiochemistry Analytical chemistry Potassium titanyl phosphate Condensed Matter Physics Trim Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion chemistry.chemical_compound Ion implantation Potassium phosphate
Zdroj:	Journal of Physics D: Applied Physics. 31:2191-2194
ISSN:	1361-6463 0022-3727
Popis:	40 keV, 50 keV and 60 keV were implanted at and into potassium titanyl phosphate ( or KTP). The depth of distribution of in was measured by the H(C nuclear reaction. The depth distributions obtained are compared with TRIM (transport of ions in matter) predictions. The results show that the TRIM simulation has described the shape of the front side of the experimental profile well, but there is significant deviation for the deep side of the profile between TRIM prediction and experimental data.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cf40da1568c9add41357f66e3c113760 https://doi.org/10.1088/0022-3727/31/17/018 Zobrazit plný text záznamu