Evaluation of Hafnium-Titanium-Oxide Thin Films Prepared by Reactive Sputtering

Autor:	Ryotaro Nakano, Hironaga Matsumoto, Noboru Miura, Kimio Ando
Rok vydání:	2002
Předmět:	Materials science Chemical engineering chemistry Sputtering chemistry.chemical_element Electrical and Electronic Engineering Thin film Condensed Matter Physics Surfaces Coatings and Films Titanium oxide Hafnium
Zdroj:	SHINKU. 45:18-25
ISSN:	1880-9413 0559-8516
DOI:	10.3131/jvsj.45.18
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cf20d7803943f9855813b3c0b9d44cf7 https://doi.org/10.3131/jvsj.45.18 Zobrazit plný text záznamu