Dissolution Inhibitors for 157 nm Lithography: A Progress Report

Autor:	Will Conley, Charles R. Chambers, Brian Osborn, Brian C. Trinque, Takashi Chiba, Andrew R. Romano, Daniel Miller, Ralph R. Dammel, C. Grant Willson, Paul Zimmerman
Rok vydání:	2002
Předmět:	chemistry.chemical_classification Materials science Polymers and Plastics chemistry Resist Organic Chemistry Materials Chemistry Nanotechnology Polymer Material Design Functional polymers Lithography Dissolution
Zdroj:	Journal of Photopolymer Science and Technology. 15:613-617
ISSN:	1349-6336 0914-9244
Popis:	Fluorocarbon based polymers have been identified as promising resist candidates for 157nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157nm resist materials based on transparent dissolution inhibitors. These 2 component resist systems have been prepared and preliminary imaging studies at 157nm are described. Several new approaches to incorporating these transparent monomers into functional polymers have been investigated and are described. The lithographic performance of some of these polymers is discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::cef283de2841cbaf963c341b68f1cde5 https://doi.org/10.2494/photopolymer.15.613 Zobrazit plný text záznamu