Difference of deposition process of an amorphous carbon film due to source gases
| Autor: | Yoshinobu Matsuda, Yuki Nitta, Tatsuyuki Nakatani, Taka-aki Kawakami, Hiroshi Fujiyama, Takanori Inayoshi, Masanori Shinohara, Hiroki Kawazoe |
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| Rok vydání: | 2010 |
| Předmět: |
chemistry.chemical_classification
Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Methane Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Hydrocarbon Carbon film chemistry Amorphous carbon Acetylene Materials Chemistry Thin film Carbon Deposition (chemistry) |
| Zdroj: | Thin Solid Films. 518:3497-3501 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2009.11.033 |
| Popis: | We compared the deposition process of an amorphous carbon film using acetylene as a source gas with the deposition process using methane. The process was investigated by using infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS). The infrared spectra showed that sp 3 -hydrocarbon species was observed in both cases: on the other hand, the sp- and sp 2 -carbon and/or hydrocarbon species was clearly observed in the film deposited using acetylene. Moreover, we observed the changes in predominant adsorbed species with film thickness in both cases; these facts suggest that an amorphous carbon film grows with the structural changes of adsorbed species in both deposition processes. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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